Title: | Comparative Study of GaN and GaAs Based Heterojunction Bipolar Transistors |
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DOI: |
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Keywords: | Heterojunction, BJT, GaN, GaAs |
Abstract: |
In this study, the base-width modulation of GaN and GaAs based
heterojunction bipolar transistor is analyzed using an enhanced
drift-diffusion model. This work has been done to understand the concept
of base width modulation clearly for designing GaN and GaAs based power
transistors. The considered structure of this study is: n-type
AlGaN/AlGaAs layer as an emitter, p-type GaN/GaAs as a base and n-type
GaN/GaAs as a collector. In order to illustrate the difference between
GaAs and GaN we have changed the material of the structure without
changing the doping concentrations. The emitter and collector widths are
remain fixed, while the base width is varied in order to find the
optimized base for providing high collector current density. For these
structures the emitter-base junction turn on voltage must be greater
than 2.7 V. The effect of C-B voltage on the base width is significant.
The neutral base-width Xb is a function of C-B voltage which is varied
by varying the C-B voltage changes from 2 to 70 volt. The change in
neutral base width leads to a significant change in the collector
current density. Finally an optimized GaN and GaAs based structure is
proposed and also which structure gives better performance between these
two has been investigated later. |
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